Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

Younghee Na; Umme Farva; Sung Min Cho; Chinho Park

Korean Journal of Chemical Engineering, Vol.26, No.6, 1785-1789, November, 2009

DOI10.1007/s11814-009-0336-y Export Citation

Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

Younghee Na¹, Umme Farva^{1, 2}, Sung Min Cho³, and Chinho Park^{1, †}

¹School of Display and Chemical Engineering, Yeungnam University, 214-1 Dae-dong, Gyeongsan 712-749, Korea
²Department of Nanomaterial Chemistry, College of Science & Technology, Dongguk University, Gyeongju 780-714, Korea
³Department of Chemical Engineering, Sungkyunkwan University, Suwon 446-740, Korea

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A simplified anodized aluminum oxide (AAO) nano-template fabrication process was developed in this study, which can be suited for the large area device applications. The pores of various sizes and depths were realized from the thin (less than 1 μm) aluminum film deposited on the sapphire substrate. The optimum morphological structure was obtained by adjusting the applied voltage, types of acid solution, its concentration and temperature which has evolved after two phases of anodization followed by chemical etching. The Ar plasma pre-treatment method was developed and applied to improve the surface roughness of thin aluminum film without severely sacrificing the deposited layer thickness.

Keywords:Anodized Aluminum Oxide;Nano-Template;Plasma Treatment

[References]

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Hu W, Yuan L, Chen Z, Gong D, Satio K, J. Nanosci. Nanotech., 2, 1 (2002)
Jeong SH, Lee KH, Synth. Metals, 139, 385 (2003)
Hwang SK, Jeong SH, Hwang HY, Lee OJ, Lee KH, Korean J. Chem. Eng., 19(3), 467 (2002)
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[Related Articles]

[1] Jeong SH, Jung SH, Lee KH, J. Korean Ind. Eng. Chem., 16(4), 461 (2005)

[2] Park J, Ryu SW, Mulli S, Korean Phys. Soc., 52, 232 (2006)

[3] Tamura H, Shirish K, Takayangi H, Jpn. J. Appl. Phys., 39, 241 (2000)

[4] Schmidt OG, Jin-Phillipp NY, Lange C, Denker U, Eberl K, Schreiner R, Grabeldinger H, Schweizer H, Appl. Phys. Lett., 77, 4139 (2000)

[5] Li Q, Han SM, Brueck SRJ, Hersee S, Jiang YB, Xu H, Appl. Phys. Lett., 83, 5032 (2003)

[6] Austin MD, Ge H, Wu W, Li M, Yu Z, Wasserman D, Lyon SA, Chou SY, Appl. Phys. Lett., 84, 5299 (2004)

[7] Chik H, Liang J, Cloutier SG, Kouklin N, Xu JM, Appl. Phys. Lett., 84, 3376 (2004)

[8] Hu W, Gong D, Chen Z, Yuan L, Saito K, Grimes CA, Kichambare P, Appl. Phys. Lett., 79, 3083 (2001)

[9] Hu W, Yuan L, Chen Z, Gong D, Satio K, J. Nanosci. Nanotech., 2, 1 (2002)

[10] Jeong SH, Lee KH, Synth. Metals, 139, 385 (2003)

[11] Hwang SK, Jeong SH, Hwang HY, Lee OJ, Lee KH, Korean J. Chem. Eng., 19(3), 467 (2002)

[12] Virk RS, Study of Voltage, Acid Concentration, and Temperature on Nanopore Attributes of Anodized Aluminum (San Jose State Univ. San Jose, 2005) pp.3-4

[13] Parkhutik VP, Shershulsky VI, J. Phys. D: Appl. Phys., 25, 258 (1992)