화학공학소재연구정보센터
Advanced Materials, Vol.20, No.12, 2303-2303, 2008
Hierarchical self-assembly of block copolymers for lithography-free nanopatterning
Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.