Advanced Materials, Vol.20, No.23, 4526-4529, 2008
Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly
Nanoscale tip-induced polymerization of a sulfur thin film affords a simple negative tone resist that can be used as a mask for substrate etching in fluorinated solutions or as a chemical template for the directed self-assembly of gold nanocrystals.