Potential of O-2 remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O-2 remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er2O3 and ZnO films. Furthermore, post-growth room-temperature remote O-2 plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO. lms. (C) 2008 Elsevier B. V. All rights reserved.