SrTiO3 with a high dielectric constant is considered a promising capacitor dielectric for dynamic random access memory. Until now, a SrTiO3 deposition with compositional uniformity and perfect conformality inside high-aspect nanoscale holes has been difficult by chemical vapor deposition (CVD) and atomic layer deposition (ALD). In this study, we report a supercritical fluid deposition (SCFD) of SrTiO3. Compared to CVD SrTiO3, the SCFD SrTiO3 showed perfect conformality and compositional uniformity inside nanosize holes. From these results, the SCFD is expected to be a solution for the stoichiometry and conformality issues of the CVD and ALD SrTiO3.