Positive and negative micropatterned copper sulfide thin films were successfully fabricated through chemical bath deposition methods. The thin films were deposited on patterned Si substrates with two different self-assembled monolayers (SAMS), i.e., NH2/CH3 and NH2/OH terminated silane, respectively. Under an optimal depositing condition, the copper sulfide thin films were selectively deposited on -NH2 regions. The resultant Cu2S crystal films, in positive and negative circle patterns, respectively, were verified by SEM, XPS, XRD spectra. UV-vis spectrum analysis demonstrated that the prepared Cu2S films exhibited high optical transmission in the visible light regions (vis) and near-infrared region (NIR), and a low hand gap of 2.48 eV. (c) 2009 Elsevier Inc. All rights reserved.