Journal of Crystal Growth, Vol.310, No.21, 4531-4534, 2008
Molecular beam epitaxy of highly antimony doped germanium on silicon
We investigated the antimony incorporation in germanium at high concentration regime above the maximum equilibrium solid solubility of 1.2 x 10(19) cm(-3). As growth method molecular beam epitaxy at temperatures between 160 and 330 degrees C was used. Electrical active Sb incorporation up to 2 x 10(20) cm(-3) was obtained. At higher chemical Sb concentrations up to 6 x 10(20) cm(-3) only a fraction of the dopants is electrically active at room temperatures. (c) 2008 Elsevier B.V. All rights reserved.
Keywords:Segregation;Molecular beam epitaxy;Germanium silicon alloys;Semiconducting germanium;Infrared devices