화학공학소재연구정보센터
Macromolecules, Vol.43, No.3, 1425-1429, 2010
Photopatterning of Poly(arylene dienylene) by the Photoacid-Catalyzed Deprotection-Elimination Reaction of a Precursor Polymer
Precursor polymers prepared from 1,4-dialkoxy-1,4-diarylcyclohexane monomers are converted to the conjugated poly(arylene dienylene)s during the course of an acid-catalyzed deprotection-elimination reaction. These materials are employed as combined active materials and photoresists in the surface patterning of luminescent conjugated polymers.