Plasma spatial nonuniformities in the 100 MHz rf driven capacitively coupled reactor used for reactive ion etching of 300 mm substrates were experimentally studied using a linear scanning optical emission spectroscopy probe. Radial profiles of plasma emission intensity were measured both in argon and fluorocarbon-containing gas mixtures in the pressure interval of 10-80 mTorr and the rf power range of 500-1250 W. It was demonstrated that the plasma emission profiles strongly depend on the working gas composition and pressure. The profiles have a bell-like shape at pressures about 10 mTorr for all gases. As the pressure increases, the profile shape becomes more complex with the central and peripheral peaks, and the amplitudes of the peaks strongly depend on the working gas composition. It is suggested that the emission profiles show plasma spatial nonuniformities that can influence the etching rate profiles obtained with such systems. According to the existing theoretical models, the most probable reasons for these plasma nonuniformities are charged particle radial diffusion at low pressures (about 10 mTorr), as well as the standing wave and skin and edge effects at higher pressures. Using the experimental emission profiles, the working conditions have been found that allow one to achieve the most uniform plasma for discharges in argon and fluorocarbon-containing gas mixtures. (c) 2008 American Vacuum Society.