A highly sensitive positive-working molecular resist based on a new molecule, 1,3,5-tris[p-(p-hydroxyphenyl)-phenyl]benzene (THTPPB), was designed and synthesized. THTPPB showed a high glass transition temperature (T-g) of 145 degrees C. Some acid-leaving groups were attached to THTPPB to realize positive-working performance developed by an alkaline aqueous developer. 70 nm line-and-space (1:1) positive tone pattern was fabricated with high sensitivity (<1 mu C/cm(2)) by the exposure to a low-energy electron beam (5 keV). (C) 2009 American Vacuum Society. [DOI:10.1116/1.3204984]