Electron-beam (e-beam) lithography is often employed in the fabrication of three-dimensional structures, i.e., e-beam grayscale lithography where dose is spatially controlled such that the remaining resist profile is as close to the target structure as possible. The resist profile is determined by the developing rate distribution in the resist, which, in turn, depends on the exposure (energy deposited) distribution. In the past, a dose-to-depth relationship derived from experiments was referred to in determining a dose distribution for fabrication of a grayscale structure. However, the relationship is structure dependent since the exposure distribution depends on the dose distribution, i.e., exposure at each point is a function of doses at all points within the electron scattering range. Hence, a more general approach is to consider an exposure-to-depth relationship and dependency of the required exposure distribution on (the shape of) structure. In this study, such an approach has been investigated for saw-tooth structures with varying slope of tooth. Fabricated saw-tooth structures and analysis of slope dependency of the required exposure distribution are presented in this article.