In this work, the authors evaluate a new type of perfluoropolyether molecule (FLUOROLINK (R) S10) to be used as an antisticking mold treatment in UV nanoimprint lithography. Unlike currently used ones, this molecule has two anchoring ends groups allowing two covalent grafting sites of the molecule to the mold surface. Obtained results on this molecule are compared to Optool DSX's ones. Using contact angle measurement, x-ray photoelectron spectroscopy, and electron spin resonance, the authors carried out chemical analysis of the evolution of antisticking treatments as a function of the number of imprints. It is found that both molecules have a roughly equivalent behavior. FLUOROLINK (R) S10 has shown less chemical resistance, attributed to its larger number of C-O bonds in the molecule, but an improved mechanical resistance, attributed to the double grafting mechanism.