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Journal of Vacuum Science & Technology B, Vol.28, No.1, C1D11-C1D14, 2010
Quantitative dopant profiling of p-n junction in InGaAs/AlGaAs light-emitting diode using off-axis electron holography
The electrostatic potential profile across the p-n junction of an InGaAs light-emitting diode with linearly graded AlGaAs triangular barriers has been measured using off-axis electron holography. Simulations of the junction profile show small discrepancies with experimental measurements in the region of the p-and n-doped AlGaAs barriers, which are located away from the InGaAs quantum wells. Revised simulations reproduce the measurements reasonably when a carrier-trap density of 6x10(16) cm(-3) in the AlGaAs barriers is subtracted from the dopant concentrations. The presence of oxygen impurities is considered as the most likely reason for the reduction in doping efficiency.
Keywords:aluminium compounds;carrier density;electron holography;gallium arsenide;III-V semiconductors;impurity states;indium compounds;light emitting diodes;p-n heterojunctions;semiconductor doping;semiconductor quantum wells