Parylene-C thin films deposited on polymer substrates using a modified chemical vapor condensation method

Hong Tak Kim; Taewook Koo; Chinho Park

Korean Journal of Chemical Engineering, Vol.27, No.3, 748-751, March, 2010

DOI10.1007/s11814-010-0165-z Export Citation

Parylene-C thin films deposited on polymer substrates using a modified chemical vapor condensation method

Hong Tak Kim, Taewook Koo, and Chinho Park^†

School of Display and Chemical Engineering, Yeungnam University, Gyeongsan 712-749, Korea

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The properties of parylene-C thin films deposited on polymer substrates using a modified chemical vapor condensation technique were investigated. The configuration of the polymerization chamber was altered from horizontal to vertical and designed with a circular symmetry in the z-direction to improve the deposition rate. The growth rate of the thin films was improved 2-5 times in a vertical configuration compared to a horizontal configuration. Potential factors responsible for such an improvement include the effect of coincidence between the flow direction of the gases and the direction of the convection in the reaction tube due to buoyancy. The synthesized films have a high transparency (>90%) in the visible region, a smooth surface morphology (Rs<5.0 nm), and amorphous phase structures with the presence of some crystalline domains.

Keywords:Parylene;Chemical Vapor Condensation;CVC;Vertical Configuration;Polymer Substrate

[References]

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Fortin JB, Ju TM, Chemical vapor deposition polymerization, Kluwer Academic Publishers, New York (2004)
Lee T, Lee J, Park C, Korean J. Chem. Eng., 19(4), 722 (2002)
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d’Agostino R, Plasma deposition, treatment, and etching of polymers, Academic Press, New York (1990)
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Hwang JY, Park C, Huang M, Anderson T, J. Cryst. Growth, 279(3-4), 521 (2005)
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[Related Articles]

[1] Crawford GP, Flexible flat panel display, John Wiley & Sons, New York (2005)

[2] Fortin JB, Ju TM, Chemical vapor deposition polymerization, Kluwer Academic Publishers, New York (2004)

[3] Lee T, Lee J, Park C, Korean J. Chem. Eng., 19(4), 722 (2002)

[4] Gorham W, J. Ploy. Sci. Part A-1, 4, 3027 (1966)

[5] Szwarc M, Discussions Faraday Soc., 2, 46 (1947)

[6] Szwarc M, J. Polym. Sci., 6, 319 (1951)

[7] Szwarc M, J. Chem. Phys., 16, 128 (1948)

[8] d’Agostino R, Plasma deposition, treatment, and etching of polymers, Academic Press, New York (1990)

[9] Mitu B, Bauer-Gogonea S, Leonhartsberger H, Lindner M, Bauer S, Dinescu G, Surface Coatings Technology, 174-175, 124 (2003)

[10] Goschel U, Walter H, Langmuir, 16(6), 2887 (2000)

[11] Chapman B, Glow discharge processes, John Wiley & Sons, New York, 13-14 (1980)

[12] Hwang JY, Park C, Huang M, Anderson T, J. Cryst. Growth, 279(3-4), 521 (2005)

[13] Callahan RRA, Pruden KG, Raupp GB, Beaudoin SP, J. Vac. Sci. Technol. B, 21(4), 1496 (2003)

[14] Beraa M, Rivatona A, Gandonb C, Gardettea JL, European Polymer Journal, 36, 1765 (2000)