Reaction Kinetics and Catalysis Letters, Vol.97, No.2, 321-327, 2009
Interaction of Co nanoparticles with SiO2: silicide formation
The interaction of 1 and 4 nm thick Co films with SiO2 support in vacuum at high temperature has been investigated by TEM, SAED and HRTEM methods. It was found that annealing in vacuum at 800 A degrees C caused the transformation of the smallest Co particles into Co2Si silicide.