화학공학소재연구정보센터
Applied Surface Science, Vol.256, No.4, 1031-1034, 2009
Observation of new critical point in InxAl1-xAs alloy using spectroscopic ellipsometry
Using a spectroscopic ellipsometry, pseudodielectric functions of InxAl1-xAs ternary alloy films (x = 0.43, 0.62, 0.75, and 1.00) from 0.74 to 6.48 eV were determined. Fast in-situ chemical etching to effectively remove surface overlayers using charge-coupled device detector and to avoid the reoxidation of the surface of films prior to the ellipsometric spectrum measurement was performed. At the high energy region, an additional critical point structure which is interpreted as the E-1' transition from the band structure calculation of the linear augmented Slater-type orbital method was reported. (C) 2009 Elsevier B.V. All rights reserved.