Two processes for the fabrication of polycrystalline CoSi2 thin films based on the codeposition of Co and Si by sputtering were studied and compared. The first process involved "annealing after deposition", where Co and Si are codeposited at ambient temperature and then crystallized by annealing. This process yielded randomly oriented plate-like CoSi2 grains with a grain size that is governed by the nanostructure of the as-deposited film. Polycrystalline CoSi2 thin films were obtained at a process temperature of 170 degrees C, which was much lower than the annealing temperature of 500 degrees C needed for Co/Si bilayers. The second process involved "heating during deposition", where Co and Si are codeposited on heated substrates. This process yielded CoSi2 grains with a columnar structure, and the grain size and degree of (1 1 1) orientation are temperature dependent. The sheet resistance of the resulting films was determined by the preparation temperature regardless of the deposition process used, i.e. "annealing after deposition" or "heating during deposition". Temperatures of 500 degrees C and higher were needed to achieve CoSi2 resistivity of 40 mu Omega cm or lower for both processes. (C) 2010 Elsevier B.V. All rights reserved.