We report a process for the flabrication of an anatase TiO2 mesosponge (TMS) layer by an optimized Ti anodization process in a hot glycerol electrolyte followed by a suitable etching process. Such layers can easily be grown to > 10 mu m thickness and have regular channels and structural features in the 5-20 nm range. The layers show high photocatalytic activity and are mechanically very robust. The layers therefore open new pathways to the wide field of TiO2(anatase) applications.