Patterned polymer brush surfaces have been fabricated using the molecular scratchcard lithography technique, where a functional top nanolayer (acting also as a resist) is selectively removed using a scanning probe tip to expose underlying atom-transfer radical polymerization (ATRP) initiator sites. The lateral spreading of grafted polymer brush patterns across the adjacent functional resist surface can be reversibly actuated via solvent exposure. Effectively, this methodology provides a means for hiding/unveiling functional surfaces on the nanoscale.