Journal of Vacuum Science & Technology A, Vol.28, No.4, 814-817, 2010
Nonlinear femtosecond laser processing of alkylsiloxane monolayers on surface-oxidized silicon substrates
Femtosecond laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates via single-pulse processing at lambda=800 nm, tau < 30 fs, and ambient conditions has been investigated. Depending on the laser pulse fluence, local irradiation results in circular spots of distinct size and morphology. At high fluences, a particular rich complexity of distinct surface morphologies is observed including hole, rim, and ripple formation, and a faint boundary area where monolayer decomposition sets in. At low fluences, subwavelength patterning of the organic monolayer is feasible. In particular, at a 1/e laser spot diameter of 1.3 mu m, surface spots with a width down to 300 nm are fabricated. Selective processing of the organic monolayer, though, is restricted to a very narrow range of fluences between 1.1 and 1.2 J/cm(2). A significantly larger parameter range for selective processing is anticipated in the case of functional monolayers that incorporate aromatic groups. Promising perspectives in femtosecond laser processing of organic monolayers are discussed. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3281296]