Journal of Vacuum Science & Technology A, Vol.28, No.4, 824-828, 2010
Tungsten oxide (WO3) thin films for application in advanced energy systems
Inherent processes in coal gasification plants produce hazardous hydrogen sulfide (H2S), which must be continuously and efficiently detected and removed before the fuel is used for power generation. An attempt has been made in this work to fabricate tungsten oxide (WO3) thin films by radio-frequency reactive magnetron-sputter deposition. The impetus being the use of WO3 films for H2S sensors in coal gasification plants. The effect of growth temperature, which is varied in the range of 30-500 degrees C, on the growth and microstructure of WO3 thin films is investigated. Characterizations made using scanning electron microscopy (SEM) and x-ray diffraction (XRD) indicate that the effect of temperature is significant on the microstructure of WO3 films. XRD and SEM results indicate that the WO3 films grown at room temperature are amorphous, whereas films grown at higher temperatures are nanocrystalline. The average grain-size increases with increasing temperature. WO3 films exhibit smooth morphology at growth temperatures <= 300 degrees C while relatively rough at > 300 degrees C. The analyses indicate that the nanocrystalline WO3 films grown at 100-300 degrees C could be the potential candidates for H2S sensor development for application in coal gasification systems. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3368495]