The performance of polydimethylsiloxane (PDMS) elastomer in many of its applications, including surface molding and replication, microcontact lithography, and microfluidic device structures, is strongly influenced by its surface properties. While PDMS polymer is simple to use, the surface hydrophobicity and adsorptive properties of PDMS limit its functionality, for example, in aqueous microfluidic applications. Atomic layer deposition (ALD) is a low temperature vapor phase thin film coating technique that has recently been used to modify and encapsulate a wide range of polymer materials. In this work, the authors investigate reactions that proceed when PDMS polymer films are treated with cyclic gas exposure sequences commonly used to perform aluminum oxide ALD. Film growth is characterized by electron and infrared spectroscopy and by contact angle goniometry for a range of surface treatments and postdeposition air exposure times. The authors find that trimethylaluminum/water ALD can produce a smooth and uniform film coating on PDMS at 25-50 degrees C and that cracks become visible under optical microscopy for films > 100 angstrom thick. At moderate temperatures, unique buckled surface textures appear in the deposited coating, which are ascribed to substrate thermal expansion effects. Aluminum oxide coatings on native PDMS, as well as on PDMS pretreated with UV ozone or oxygen plasma, show a hydrophilic surface condition immediately after deposition, but the surface becomes more hydrophobic after 24-48 h in ambient air or under inert gas storage, likely due to organic species out-diffusion through defects in the ALD coating. Infrared analysis is also used to identify consistent mechanisms associated with subsurface ALD nucleation on cast PDMS layers. These results provide valuable insight into a means to reliably modify the surface of PDMS using vapor phase precursor/surface reactions. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3488604]