A novel method for cleaning a high vacuum chamber is presented. This method is based on concurrent in situ high-energetic UV light activation of contaminants located in the residual gas and at the vacuum chamber surfaces as well as the in situ generation of highly reactive ozone. Ozone oxidizes the contaminants to volatile species. Investigations by energy-dispersive x-ray analysis of residual gas depositions and mass-spectroscopy measurements of the residual gas in the vacuum chamber identify the contaminant species as hydrocarbons. After a cleaning period of 8 h, a decrease in measured chamber contamination by about 90% could be achieved according to atomic force microscope analysis. Mass spectroscopy measurements using a residual gas analyzer indicate the creation of volatile, carbonaceous species during the cleaning process. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3484242]