The fabrication of high-resolution nanostructures in both poly(p-phenylene vinylene), PPV, and a crosslinkable derivative of poly(9,9'-dioctylfluorene), F8, using scanning near-field optical lithography, is reported. The ability to draw complex, reproducible structures with 65000 pixels and lateral resolution below 60 nm (< lambda/5) is demonstrated over areas up to 20 mu m x 20 mu m. Patterning on length-scales of this order is desirable for realizing applications both in organic nanoelectronics and nanophotonics. The technique is based on the site-selective insolubilization of a precursor polymer under exposure to the confined optical field present at the tip of an apertured near-field optical fiber probe. In the case of PPV, a leaving-group reaction is utilized to achieve insolubilization, whereas the polyfluorene is insolubilized using a photoacid initiator to create a crosslinked network in situ. For PPV, resolubilization of the features is observed at high exposure energies. This is not seen for the crosslinked F8 derivative, r-F8Ox, allowing us to pattern structures up to 200 nm in height.