Size variations of pattern spacing as well as gradient control of the as-formed polymeric pattern via a spatially controlled reflow process are presented. Micro-and nanopatterns of polymethyl methacrylate (PMMA) in the form of line-and-space strips are first generated by capillary force lithography (CFL), and the residual layers are removed by ashing process. Subsequently, the exposed PMMA strips underwent a controlled reflow process above the glass transition temperature (T-g) while heating single or both sides of the substrate either in parallel to the line pattern (parallel reflow) or perpendicular to the line pattern (perpendicular reflow). As a result of this controlled reflow, a linear or a parabolic profile of pattern spacing is achieved depending on the heating mode. Furthermore, multiscale gradient patterns are formed with the spacing ranging from 98 nm to 4.23 mu m (a difference of two orders of magnitude) in a single patterned layer using the original micropattern of 16 mu m width and 8 mu m spacing. In order to explain reflow behaviors, a simple theoretical model relating the normalized pattern width to the polymer viscosity is derived based on a leveling kinetics of polymer melt. Also, gradient PMMA channels are fabricated and bonded to a glass substrate, which are used to flow a liquid inside the channels by capillarity-driven flow.