Applied Surface Science, Vol.257, No.16, 7172-7178, 2011
Structure and properties of (AlCrMnMoNiZrB0.1)N-x coatings prepared by reactive DC sputtering
The microstructure and properties of AlCrMnMoNiZrB0.1 nitride films prepared by reactive direct current sputtering at various N-2-to-Ar flow ratios (R-N) were investigated. The films had an amorphous structure at low R-N and a face-centered cubic structure at a high R-N. As the R-N increased, the decrease in clusters and defects resulted in a dense columnar structure and low surface roughness. The peak hardness and modulus of the nitride films were 10.3 and 180 GPa, respectively. The enhanced hardness is ascribed to the increased metal-nitrogen bonding, solid solution strengthening of several metallic nitrides, and lattice strain. The nitride films deposited at R-N = 0.2, 0.5, and 0.8 had friction coefficients of 0.16, 0.12 and 0.15, respectively. Wear-out failure occurred within 400s when R-N = 0 and 1.0. Adhesive wear was the dominant wear mechanism. (C) 2011 Elsevier B.V. All rights reserved.