Previous Article Next Article Table of Contents Applied Surface Science, Vol.257, No.17, 7906-7906, 2011 DOI10.1016/j.apsusc.2011.04.059 Export Citation The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD (vol 257, pg 3776, 2011) Kim D, Kang H, Kim JM, Kim H Please enable JavaScript to view the comments powered by Disqus.
