Modeling studies on the effects of the process parameters in forced-flow chemical vapor infiltration reactor for the preparation of C/C composites

Dong Geun Hwang; Gui Yung Chung

Korean Journal of Chemical Engineering, Vol.29, No.9, 1266-1271, September, 2012

DOI10.1007/s11814-011-0303-2 Export Citation

Modeling studies on the effects of the process parameters in forced-flow chemical vapor infiltration reactor for the preparation of C/C composites

Dong Geun Hwang, and Gui Yung Chung^†

Department of Chemical Engineering, Hongik University, 72-1, Sangsu-dong, Mapo-gu, Seoul 121-791, Korea

E-mail:

The mathematical modeling for the preparation of C/C composites from propane by F-CVI (Forced-flow chemical vapor infiltration) was studied. Experimental data were fitted with the modeling calculations and an adjusted reaction rate constant was obtained. Effects of many operation parameters such as temperature, the inlet concentration of propane, flow rate, and the initial porosity were observed. The decrease of the deposition rate due to the decrease of porosity and the depletion of propane in the middle of the preform was compensated with the increase of the lateral surface area of fibers. It was confirmed that a slow reaction rate with a low temperature and a low concentration is necessary for a uniform infiltration. As the gas flow rate and the initial porosity increase, the amount of deposition increases.

Keywords:C/C Composites;CVI;Propane;Numerical Modeling;Process Parameter

[References]

Delhaes P, Carbon., 40, 641 (2002)
Zhang W, Huttinger KJ, Compos. Sci. Technol., 62, 1947 (2002)
Birakayala N, Evans EA, Carbon., 40, 675 (2002)
Norinaga K, Deutschmann O, Ind. Eng. Chem. Res., 46(11), 3547 (2007)
Nannetti CA, Riccardi B, Ortona A, La Barbera A, Scafea E, Vekinis G, Nucl. Mater, 307, 1196 (2002)
Gupte SM, Tsamopoulos JA, J. Electrochem. Soc., 136, 555 (1989)
Chung GY, McCoy BJ, Smith JM, Cagliostro DE, AIChE J., 39, 1834 (1993)
Chung GY, McCoy BJ, Smith JM, Cagliostro DE, Chem.Eng. Sci., 47, 311 (1992)
Chung GY, McCoy BJ, J. Am. Ceram. Soc., 74, 746 (1991)
Kim CW, Cho MS, Chung GY, Korean Chem. Eng. Res., 34, 443 (1996)
Li HJ, Jiang KY, Li KZ, Mater. Lett., 57, 2366 (2003)
Jiang K, Li H, Wang M, Mater. Lett., 54, 419 (2002)
Lacroix R, Fournet R, Ziegler I, Marquaire PM, Carbon., 48, 132 (2010)
Chung HK, Chung GY, Koo HH, Baek WH, Korean J. Chem. Eng., 21(5), 929 (2004)
Langhoff TA, Schnack E, Chem. Eng. Sci., 63(15), 3948 (2008)
Ibrahim J, Paolucci S, Carbon., 49, 915 (2011)
Ziegler I, Fournet R, Marquaire PM, J. Anal. Appl. Pyrol., 73, 107 (2005)
Vaidyaraman S, Lackey WJ, Agrawal PK, Carbon., 34, 609 (1996)
Tesner PA, Chemistry and physics of carbon, Edited by Thrower PA, 9, 173 (1973)

[Referenced By]

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[1] Delhaes P, Carbon., 40, 641 (2002)

[2] Zhang W, Huttinger KJ, Compos. Sci. Technol., 62, 1947 (2002)

[3] Birakayala N, Evans EA, Carbon., 40, 675 (2002)

[4] Norinaga K, Deutschmann O, Ind. Eng. Chem. Res., 46(11), 3547 (2007)

[5] Nannetti CA, Riccardi B, Ortona A, La Barbera A, Scafea E, Vekinis G, Nucl. Mater, 307, 1196 (2002)

[6] Gupte SM, Tsamopoulos JA, J. Electrochem. Soc., 136, 555 (1989)

[7] Chung GY, McCoy BJ, Smith JM, Cagliostro DE, AIChE J., 39, 1834 (1993)

[8] Chung GY, McCoy BJ, Smith JM, Cagliostro DE, Chem.Eng. Sci., 47, 311 (1992)

[9] Chung GY, McCoy BJ, J. Am. Ceram. Soc., 74, 746 (1991)

[10] Kim CW, Cho MS, Chung GY, Korean Chem. Eng. Res., 34, 443 (1996)

[11] Li HJ, Jiang KY, Li KZ, Mater. Lett., 57, 2366 (2003)

[12] Jiang K, Li H, Wang M, Mater. Lett., 54, 419 (2002)

[13] Lacroix R, Fournet R, Ziegler I, Marquaire PM, Carbon., 48, 132 (2010)

[14] Chung HK, Chung GY, Koo HH, Baek WH, Korean J. Chem. Eng., 21(5), 929 (2004)

[15] Langhoff TA, Schnack E, Chem. Eng. Sci., 63(15), 3948 (2008)

[16] Ibrahim J, Paolucci S, Carbon., 49, 915 (2011)

[17] Ziegler I, Fournet R, Marquaire PM, J. Anal. Appl. Pyrol., 73, 107 (2005)

[18] Vaidyaraman S, Lackey WJ, Agrawal PK, Carbon., 34, 609 (1996)

[19] Tesner PA, Chemistry and physics of carbon, Edited by Thrower PA, 9, 173 (1973)