Korean Chemical Engineering Research, Vol.50, No.3, 455-463, June, 2012
EO-PO가 부가된 양쪽성 계면활성제의 등전점 및 유연력 측정에 관한 연구
Measurement of an Isoelectric Point and Softness of a EO-PO Adducted Zwitterionic Surfactant
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초록
본 연구에서는 에틸렌 옥사이드와 프로필렌 옥사이드가 부가된 DEP-OSA82-AO 양쪽성 계면활성제에 대하여 계면활성제의 기본적인 물성(임계 마이셀 농도, 표면장력, 계면장력, 접촉각, 점도, 기포 안정성 등)을 측정하였다. 또한 계면활성제 수용액에 대한 제타전위 측정과 QCM (quartz crystal microbalance) 실험을 통하여 양쪽성 계면활성제가 양이온 계면활성제에서 비이온 계면활성제로 작용이 전환되는 등전점을 결정하였다. 제타전위 측정을 통하여 결정한 양쪽성 계면활성제의 등전점은 QCM 실험을 통하여 결정한 등전점 결과가 거의 일치하였으며, 표면 마찰 시험기를 사용하여 측정한 유연력 측정 결과와도 일치하는 경향을 나타내었다. 특히 DEP32-OSA82-AO와 DEP34-OSA82-AO 계면활성제의 경우, 산성 조건 혹은 중성 조건일 경우가 알칼리성 조건에 비하여 섬유 유연 효과가 큰 것을 확인하였는데, 이러한 결과는 등전점 보다 낮은 pH 산성 혹은 중성 조건에서 DEP32-OSA82-AO와 DEP34-OSA82-AO 계면활성제가 모두 양이온 계면활성제로 작용함으로써 세탁 후 린스 과정에서 유연제로서 효과적으로 작용할 수 있음을 의미한다.
In this study, the measurement of physical properties of ethylene oxide-propylene oxide adducted zwitterionic surfactants were measured such as critical micelle concentration, surface tension, interfacial tension, contact angle, viscosity and foam stability. Also, the dual function characteristics of a zwitterionic surfactant were investigated by determining an isoelectric point, which were obtained using zeta potential measurement and QCM (quartz crystal microbalance) experiments. The isoelectric point of DEP-OSA82-AO zwitterionic surfactant determined by zeta potential measurement was close to that obtained by QCM experiment and both results have shown almost the same trend as that determined by the frictional property measured using an automated mildness tester. In particular, it has been observed that DEP32-OSA82-AO and DEP34-OSA82-AO surfactants provide better softening effect at a pH of acidic or neutral condition than at an alkaline condition. This result indicates that both surfactants act as a cationic surfactant at a pH of acidic or neutral condition and thus provide good softening effect during a rinsing cycle in the detergency process.
Keywords:EO-PO Adducted Zwitterionic Surfactant;Softness;Isoelectric Point;QCM (quartz crystal microbalance);Zeta Potential
- Cutler WG, Kissa E, Detergency: Theory and Technology, Surfactant Science Series, 20, 1, Marcel Dekker, New York (1987)
- Schwartz AM, The Physical Chemistry of Detergency ed. E. Matijevic, Surface Colloid Sci., 195, Wiley, New York (1972)
- Miller CA, Neogi P, Interfacial Phenomena : Equilibrium and Dynamic Effects, Surfactant Science Series, Marcel Dekker, New York, 17, 150 (1985)
- Lee SK, Han JW, Kim BH, Shin PG, Park SK, Lim JC, J. Korean Ind. Eng. Chem., 10(4), 537 (1999)
- Ko HK, Park BD, Lim JC, J. Korean Ind. Eng. Chem., 11(6), 679 (2000)
- Ko HK, Lee JK, Park SJ, Park BD, Hong JK, Park SK, Lim JC, HWAHAK KONGHAK, 40(3), 316 (2002)
- Lee JG, Bae SS, Cho IS, Park SJ, Park BD, Park SK, Lim JC, J. Korean Ind. Eng. Chem., 16(5), 664 (2005)
- Lee JG, Bae SS, Cho IS, Park SJ, Park BD, Park SK, Lim JC, J. Korean Ind. Eng. Chem., 16(5), 677 (2005)
- Lim JC, J. Korean Ind. Eng. Chem., 16(6), 778 (2005)
- Lim JC, Korean Chem. Eng. Res., 45(3), 219 (2007)
- Bae MJ, Lim DC, Korean Chem. Eng. Res., 47(1), 24 (2009)
- Bae MJ, Lim JC, Korean Chem. Eng. Res., 47(1), 46 (2009)
- Bae MJ, Lim JC, J. Korean Ind. Eng. Chem., 20(5), 473 (2009)
- Bae MJ, Lim JC, J. Korean Ind. Eng. Chem., 20(1), 15 (2009)
- Lee S, Kim BJ, Lee JG, Lim JC, Appl. Chem. Eng., 22(1), 37 (2011)
- Rang MJ, Kim JD, Oh SG, Lee BM, Lim JC, Hong JD, Kang HH, Lee JG, The Recent Research Trends in Colloid and Surface Chemistry, 45, KOSFT, Seoul (2007)
- Han DS, Yoo KM, Park JS, Chi GY, Lee KM, Cho IS, Lim JC, Appl. Chem., 11(1), 229 (2007)
- Rendall K, Tiddy GJT, Trevethan MA, J. Colloid Interface Sci., 98(2), 565 (1984)
- Kim JS, Park JS, Lim JC, J. Korean Ind. Eng. Chem., 20(1), 9 (2009)
- Kim JS, Park JS, Lim JC, Korean Chem. Eng. Res., 47(1), 31 (2009)
- Lim JC, Han DS, Colloid Surf. A: Physicochem. Eng. Aspects., 389(1-3), 166 (2011)
- Hoffmann H, Thunig C, Miller CA, Colloid Surf. A: Physicochem. Eng. Aspects., 67, 223 (1992)
- Ro YC, Nam KD, J. Korean Ind. Eng. Chem., 5(5), 749 (1994)
- Rosen MJ, Gao T, Nakasuji Y, Masuyama A, Colloid Surf. A: Physicochem. Eng. Aspects., 88(1), 1 (1994)
- Rang MJ, Lim JC, Miller CA, Thunig C, Hoffmann HH, J. Colloid Interface Sci., 175(2), 440 (1995)
- Harwigsson I, Tiberg F, Chevalier Y, J. Colloid Interface Sci., 183(2), 380 (1996)
- Maria PD, Fontana A, Gasbarri C, Siani G, Tetrahedron., 61(30), 7176 (2005)
- Baik IS, Cho IS, Chi GY, Han DS, “Aminooxide Type Surfactant and Detergent Composition Comprising It,” U.S. Patent No. 7,538,248 (2009)
- Kim JS, Lim JC, J. Korean Ind. Eng. Chem., 20(5), 479 (2009)
- Kim JS, Lim JC, Korean Chem. Eng. Res., 47(1), 38 (2009)
- Mitchell DJ, Tiddy GJT, Waring L, Bostock T, Macdonald MP, J. Chem. Soc. Faraday Trans., 79(1), 975 (1983)
- Ghosh O, Miller CA, J. Phys. Chem., 91(17), 4528 (1987)
- Chiu TY, James AE, Colloid Surf. A: Physicochem.Eng. Aspects., 280(1-3), 58 (2006)
- Jeon MW, Oh SG, Kim YC, Colloid Surf. A:Physicochem. Eng. Aspects., 181(1-3), 247 (2001)