Dense and uniform particle films are deposited using a robust version of the convective particle assembly process. We analyze how the shape of the gas-liquid interface and the three-phase contact line govern the stability of convective deposition and, thus, the achievable quality of films. Interference microscopy indicates that a highly curved meniscus cannot compensate for the ubiquitous perturbation during deposition. A moderately curved meniscus provides flexibility to compensate and localize perturbation and enables reliable homogeneous deposition. We analyze which setup geometry and meniscus velocity yield appropriate meniscus shapes. The quality of the resulting films is analyzed and compared to the deposition conditions. Uniform films over areas beyond the centimeter range are accessible using the optimized process, which is suitable for functional particle coatings and templates for microstructured materials.