화학공학소재연구정보센터
International Journal of Heat and Mass Transfer, Vol.39, No.7, 1429-1438, 1996
Thermophoretic Deposition Including an Application to the Outside Vapor-Deposition Process
A study has been made of the flow, heat and mass transfer with chemical reactions and thermophoretic deposition with application to the outside vapor deposition (OVD) process. The system includes a flow that is emerging from a burner containing methane, oxygen, nitrogen and silicon tetrachloride and impinges on a cylindrical target. Silica soot particles are formed by the oxidation of silicon tetrachloride and the motion of the particles is determined from the combined effects of thermophoresis, buoyancy and the forced flow. The governing equations which include the effects of buoyancy, variable properties, chemical reactions and thermophoretic transport have been solved numerically for a slot burner and a long cylinder in a two-dimensional configuration. The effects of the separation distance between the burner and the target, the diameter and the rotational speed of the target and the eccentricity of the burner have been studied. The particle deposition Bur and the deposition efficiency are investigated over a range of values of the parameters.