Hydrogenated-carbon nitride (CN(x):H) films were synthesized on silicon substrate in a large quantity by the pyrolysis of ethylenediamine in a temperature range of 700-950 degrees C. The influence of temperature on the morphology, structure, adhesion to substrate, and friction and wear behavior of CN(x):H films was investigated. It has been found that CN(x):H films obtained at 700 degrees C and 800 degrees C are amorphous, and those prepared at 900 degrees C and 950 degrees C consist of carbon nitride nanocrystal. Besides, CN(x):H film sample obtained at 700 degrees C has the maximum N content of 9.1 at.% but the poorest adhesion to Si substrate, while the one prepared at 900 degrees C has the lower N content and the highest adhesion to substrate. As a result, nanocrystalline CN(x):H (nc-CN(x):H) film synthesized at 900 degrees C possesses the best wear resistance when slides against stainless steel counterpart. N atom is incorporated into the graphitic network in three different bonding forms, and their relative content is closely related to temperature, corresponding to different adhesion as well as friction and wear behavior of the films obtained at different temperatures. Furthermore, the friction coefficient and antiwear life of as-deposited CN(x):H films vary with varying deposition temperature and thickness, and the film with thickness of 1.3 mu m, obtained at 900 degrees C, has the longest antiwear life of over 180,000 s. (C) 2011 Elsevier B.V. All rights reserved.