Samples were deposited using chemical spray pyrolysis technique by varying the pH of the starting precursor solution from 0.8 to 3.2. These samples were analyzed using X-ray diffraction, optical absorption spectroscopy, energy dispersive X-ray analysis, scanning electron microscopy, and electrical measurements in order to investigate the role of pH of the precursor solution on structural, morphological, electrical and optical properties of the SnS films. From the study we could optimize the pH of precursor solution required for the deposition of device quality SnS thin films. Resistivity of the films was brought down by three orders (to 6 x 10(-2) Omega cm) along with enhancement in grain size as well as photosensitivity by optimizing the pH of the precursor solution alone. Band gap of the films could also be tailored by controlling the pH of the precursor solution. (C) 2012 Elsevier B. V. All rights reserved.