Previous Article Next Article Table of Contents International Journal of Heat and Mass Transfer, Vol.42, No.6, 1141-1146, 1999 DOI10.1016/S0017-9310(98)00176-8 Export Citation Optimization of inlet concentration profile for uniform deposition in a cylindrical chemical vapor deposition chamber Cho WK, Choi DH, Kim MU Keywords:FLOW;REACTOR Please enable JavaScript to view the comments powered by Disqus.