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Current Applied Physics, Vol.11, No.3, S244-S246, 2011
Characterization of epitaxial BiFeO3 thin films prepared by ion beam sputtering
We report on deposition of epitaxial BiFeO3 (BFO) thin films on SrRuO3-buffered SrTiO3 (001) substrate by using ion beam sputtering process. An X-ray diffraction analysis indicate that the BFO thin film deposited at 500 degrees C using a target with Bi/Fe ratio of 1.05 is perovskite single phase and is epitaxially grown on the substrate. The BFO thin film show saturated D-E hysteresis loops and the double remanent polarization (2P(r)) of 100 mu C/cm(2) without measurement frequency dependence. (C) 2010 Elsevier B.V. All rights reserved.