The objective of the present work was to study the electrostatic component of adhesion in metal film-polymer systems under low energy (some keV) photon irradiation. In this energy region electrostatic forces can be influenced directly by fast secondary electrons. Quantum yields of such electrons for Al, Ag, Au, polyethylene, Mylar, PVC, and Teflon were calculated with the special Monte Carlo code and used as input for an analytical model of the charge profile formation near the metal film-polymer interface. The dependence of adhesion characteristics on photon energy and atomic number of materials (metal films, polymer substrates) is discussed.