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Influence of Chloride Ion on Tungsten (W) and Silicon dioxide (SiO2) films for the W Chemical Mechanical Planarization (CMP) process Jae-Young Bae, Soo-Bum Kim, Eun-Bin Seo, Haneol Choi, Jin-Hyung Park, Jea-Gun Park 한국재료학회 2018년 가을 학술대회 |