화학공학소재연구정보센터
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3 THE ROLE OF SURFACE FUNCTIONAL GROUPS OF SiOC:H LOW-K FILMS ON THE NUCLEATION OF ATOMIC-LAYER-DEPOSITED RUTHENIUM
Jaeyeong Heo, Seok-Jun Won, Sanghyun Park, Cheol Seong Hwang, Hyeong Joon Kim
한국재료학회 2008년 가을 학술대회
2 Deposition and Characterization of Bi doped Ge2Sb2Te5 Thin Films for Phase Change Random Access Memory Application
Jong Ho Lee, Seung Wook Ryu, Yeong Bae Ahn, Se-Ho Lee, Cheol Seong Hwang, Hyeong Joon Kim
한국재료학회 2008년 가을 학술대회
1 Electrical property of Al2O3 deposited in low temperature by sputtering process
Bong Seob Yang, Myung Soo Huh, Hyeong Joon Kim
한국재료학회 2008년 가을 학술대회