| 6 |
Effects of Organic Additives in Ceria Slurry on Enhanced Oxide-to-Nitride Removal Selectivity in Shallow Trench Isolation Chemical Mechanical Polishing
Byeong-Seog LEE, Hyun-Goo KANG, Kyung-Woong PARK, Ungyu PAIK, Jea-Gun PARK
한국재료학회 2006년 가을 학술대회 |
| 5 |
Effects of Surfactant Molecular weight and Concentration in Nano-Ceria Slurry on Nanotopography Impact in Chemical Mechanical Polishing
Hyuk-Yul CHOI, Hyun-Goo KANG, Jun-Seok KIM, Ungyu PAIK, Jea-Gun PARK
한국재료학회 2006년 가을 학술대회 |
| 4 |
Reduction of Large Particles and Light Point Defects (LPD) by Aging and Selective Sedimentation Process in Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
Byong-Seog Lee, Hyun-Goo Kang, Kyung-Woong Park, Ungyu Paik, Jea-Gun Park
한국재료학회 2006년 봄 학술대회 |
| 3 |
Effects of Non-Prestonian Behavior of Ceria Slurry with Anionic Surfactant on Abrasive Concentration and Size in Shallow Trench Isolation Chemical Mechanical Polishing
Hyuk-Yul CHOI, Hyun-Goo KANG, Jun-Seok KIM, Ungyu PAIK, Jea-Gun PARK
한국재료학회 2006년 봄 학술대회 |
| 2 |
기계·화학적인 연마에서 슬러리의 특성에 따른 나노토포그래피의 영향과 numerical 시뮬레이션|Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing and Its Numerical Simulation
Takeo Katoh, Min-Seok Kim, Ungyu Paik, Jea-Gun Park
한국재료학회 2003년 가을 학술대회 |
| 1 |
STI CMP용 나노 세리아 슬러리에서 연마입자의 결정특성에 따른 평탄화 효율의 의존성|Dependency of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
Hyun Goo Kang, Takeo Katoh, Sung Jun Kim, Ungyu Paik, Jea-Gun Park
한국재료학회 2003년 가을 학술대회 |
