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Effect of pH in Colloidal Silica Slurry on Polishing Rate Selectivity of Nitrogen-doped Ge2Sb2Te5 to SiO2 in Chemical Mechanical Polishing Woong-Jun Hwnag, Jong-Yung Cho, Hao Cui, Jin-Hyung Park, Ungyu Paik, Jea-Gun Park 한국재료학회 2009년 봄 학술대회 |