| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 봄 (04/11 ~ 04/12, 대전컨벤션센터) |
| 권호 |
38권 1호 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Electrically and Thermally Stable Gate Dielectrics by Thiol-Ene Cross-Linked Systems for Organic Thin-Film Transistors |
| 초록 |
Novel thiol-ene type materials for a solution-processable gate dielectric for organic thin-film transistors (OTFTs) have been designed and demonstrated in this study. Incorporation of a UV-sensitive functional groups in this thiol-ene system allows us to obtain electrically and thermally stable gate dielectric layer by simple photocuring method. The very smooth thiol-ene gate dielectric layer exhibits excellent insulating properties (leakage current densities ~10-7-10-8 Acm-2) and relatively high dielectric constant (about 5) with high environmental stability. OTFTs utilizing the thiol-ene gate dielectrics with various organic semiconductors show the enhanced TFT performances especially, without any hysteresis and threshold-voltage shift compared with representative organic gate dielectric polymer, cross-linked poly(4-vinylphenol). |
| 저자 |
고정민, 강영훈, 조성윤, 이창진
|
| 소속 |
한국화학(연) |
| 키워드 |
Organic gate dielectric; thiol-ene; photo curing; OTFT
|
| E-Mail |
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