| 초록 |
Chemical surface nanostructures were obtained using self-assembled monolayer patterned by microcontact printing or nanoimprint technique. But these approaches are inadequate at the micron- and sub-micron scales. Serial techniques like dip-pen and electron-beam lithographies achieve nanoscale patterns but are limited to define large area patterns. In this study, we use Si-containing block copolymer lithography for fabricating highly ordered nanoporous SiO2 structures on gold substrates. The materials with silanol end groups self-assembled on the SiO2 surface, while the compounds with the thiol groups on the gold surface. This dually patterned self-assembly method not only form ordered nanostructures over large area, but also offer dense periodic arrays of inorganic oxide. |
