| 초록 |
Micelles formed in a selective solvent of block copolymers are useful platforms that can be used in various applications including nanolithography, nano-reactors, medicinal carriers, etc. With the advances in polymer chemistry, controlling the architecture, molecular weight and chemical composition have enabled the variation in the morphology, size, and functionality of block copolymer micelles, which expanded their potential applications. In this work, we report the formation of micelles of PS-b-PDMS block copolymer and their nanostructures on the substrate. PS-b-PDMS micellar films were deposited on silicon wafer and treated with plasma subsequently. This process removed PS blocks and turned PDMS blocks into silica which was oxidized form of PDMS on the substrate. It was found that the silica nanostructure can be manipulated by controlling the various parameters. |
