| 초록 |
In this presentation, we discuss the degradation behaviour of poly(semi-perfluoroalkyl methacrylate)s (PRFMAs) by high-energy electron beam (e-beam) irradiation. It was observed that the PRFMA films became more soluble under low exposure doses of e-beam possibly by main-chain scission reactions, but they were changed insoluble with higher doses. Accordingly, we tried to explain this phenomenon based on the analysis of FT-IR, XPS and mass spectrometer. The results showed that the free radical-based Norrish Type degradation pathways may be less relevant to the case of PRFMAs. It was also suggested that scission reactions of the perfluoroalkyl moieties of PRFMAs do not occur by e-beam. therefore we assumed that the decrease in solubility might be caused by the intermolecular cross-linking reactions between the perfluoroalkyl groups. This imaging mechanism of PRFMAs may be employed usefully for the high resolution lithographic patterning of delicate organic or bio-related materials. |
