| 초록 |
We have fabricated nano-rods of silicon oxides using a monolayer film of diblock copolymer micelles as a mask of dry etching process. Monolayer films of PS-PVP micelles containing metal salts (HAuCl4, ZnCl2, FeCl3) loaded selectively in the core were fabricated on the silicon oxide substrate simply by the spin coating method. The film showed a nano-structure in a pseudo-hexagonal array. Then, by oxygen plasma, metal salts in the core were oxidized to the corresponding metal oxides and all the organic components were removed, resulting in nano-structured metal oxides in a pseudo-hexagonal array on the silicon oxide substrate. With the nano-structured metal oxides as a mask of CF4/O2 etching process, nano-rods of silicon oxides were successfully fabricated and characterized using TEM, FE-SEM, and AFM. |
