| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Fluorous Solvent-Soluble Photoresists based on a Photodimerization Chemistry |
| 초록 |
Conventional photolithography could not have been widely applied to the materials patterning in organic electronics because of the chemical compatibility issues between the photoresists and organic semiconductors. To settle down this problem, highly fluorinated photoresists and fluorous solvents are proposed as chemically non-damaging imaging materials based on their oleophobic character, which forms the basis of Orthogonal Processing. In this presentation, we report P(FDMA-AHMA) which makes images by the photodimerization chemistry of anthracene as a non-damaging photoresist. We also synthesised a benchmark resist, an acid-cleavable P(FDMA-MAMA) and compared its performance to that of P(FDMA-AHMA). Finally, the patterning capabilities of P(FDMA-AHMA) were demonstrated by the pixelpatterning of OLEDs. With the current density-voltage and luminance-voltage data, it was possible to confirm the OLEDs processed with P(FDMA-AHMA) possess significantly improved performances. |
| 저자 |
오현택1, 박명진2, 정희영2, 김수현1, 임종민3, 박혜진1, 정석헌1, 정병준4, 황도훈3, 이창희2, 이진균1
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| 소속 |
1인하대, 2서울대, 3부산대, 4서울시립대 |
| 키워드 |
photolithography; Orthogonal Processing
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| E-Mail |
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