| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Patterning Block Copolymer through Conventional 193 nm ArF Lithography and subsequent thermal flow |
| 초록 |
We present block copolymer multiple patterning as an efficient and truly scalable nanolithography for sub-20 nm scale patterning, synergistically integrated with conventional ArF lithography. The directed assembly of block copolymers on chemically patterned substrates prepared by ArF lithography generated linear vertical cylinder arrays with 20 to 30 nm diameter, enhancing the pattern density of the underlying chemical patterns by a factor of two or three. This self-assembled resolution enhancement technique affords a straightforward route to highly ordered sub-20 nm scale features via conventional lithography. |
| 저자 |
문정호, 박승학, 신동옥, 김봉훈, 문형석, 김주영, 김상욱
|
| 소속 |
한국과학기술원 |
| 키워드 |
Block Copolymer; lithography; photoresist; patterning
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| E-Mail |
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