| 초록 |
In this presentation, a semi-perfluorinated molecular glass resist, RF-T-OtBoc, was prepared from a semi-perfluoroalkyl epoxide and an amorphous phenol, α,α,α-tris(4-hydroxyphenyl)-1-ethyl-4-isopropylbenzene. By epoxide ring-opening reactions with the perfluoroalkyl epoxide and phenolic parts at the amorphous material, new secondary hydroxyl groups were generated which could be employed to protect reactions with di-tert-butyl dicarbonate. After these simple reactions were done, thin films of RF-T-OtBoc with a fluorous solvent-soluble photoacid generator could be patterned down to 20 μm-sized features under 365 nm UV exposure conditions. Finally, the fluorinated resist, fluorous solvents, and optimized processing parameters were applied to micropatterning of green phosphorescent organic light emitting diode pixels to construct 30 μm pixels on an organic hole-transporting material film. |
