| 학회 | 한국재료학회 |
| 학술대회 | 2007년 가을 (11/02 ~ 11/02, 성균관대학교) |
| 권호 | 13권 2호 |
| 발표분야 | 반도체재료 |
| 제목 | Study of substrate temperature effect on FC(Fluorinated carbon) film using C4F8(Octafluorocyclobutane) precursor. |
| 초록 | Fluorinated carbon (FC) film, has a hydrophobic property and it is widely used as an anti-stiction layer. In other words, FC film, used as an anti-stiction layer on a mold, is being studied to prevent pattern damage during imprinting process in semiconductor and MEMS (Micro Electro Mechanical system)devices. In this paper, optimum conditions of FC film were investigated by varying pressure and substrate temperature. We used C4F8(Octafluorocyclobutane)gas, as a precursor, which has rapid deposition rate and makes high quality film of fluorinated carbon. FC film was easily and rapidly deposited by PECVD(plasma enhanced chemical vapor deposition) method, and we measured various properties of these films, such as contact angle, surface energy, thickness and composition analysis of this layer using FTIR (Fourier Transform Infrared Spectrometer). The surface energy was calculated using the data from contact angle measurement, thickness variation was measured using ellipsometer, and composition analysis using FTIR was performed to detect any variation in composition as pressure and substrate temperature were varied. |
| 저자 | 성미린, 이계영, 김규채, 이선영, 임현우 |
| 소속 | 한양대 |
| 키워드 | C4F8(Octafluorocyclobutane); PECVD(plasma enhanced chemical vapor deposition); FC (Fluorinated carbon) film; FTIR(Fourier Transform Infrared Spectrometer) |
