| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Controlled organic thin film growth via solution-based molecular-layer-deposition |
| 초록 |
The 3-d organic molecular network films were successfully prepared via molecular-layer-deposition on amine functionalized surface with tetraphenylmethane (TPM) derivatives. The thickness of films could be controlled on the molecular level by varying the number of deposition cycles. Nanometer-scale thickness growth was examined by AFM. The measured thickness was comparable to theoretical value. The UV absorption intensity of the films was proportional to the number of deposition cycles. X-ray analysis showed that the structure of the MLD films has layered order. |
| 저자 |
김명숙1, 변민선2, 배재성2, 문수영2, 우은택3, 신규순3, 박지웅1
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| 소속 |
1광주과학기술원 / 분자레벨집적화기초연구센터, 2광주과학기술원, 3서울대 |
| 키워드 |
MLD; controlled organic thin film
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| E-Mail |
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